Overview of Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target
Titane (Ti) est un élément chimique de numéro atomique 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Découvert dans 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.
Feature of Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target
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Low Density and High Strength: Titanium is about 45% lighter than steel but possesses similar strength, making it ideal for applications where weight reduction is critical without compromising strength.
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Corrosion Resistance: It forms a passive oxide layer that protects the underlying metal from corrosive substances, including sea water and chlorine, making it highly resistant to corrosion.
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Biocompatibilité: Titanium is well-tolerated by the human body and doesn’t cause adverse reactions, which is why it’s widely used in medical implants and surgical instruments.
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Résistance à la chaleur: With a melting point of 1,668°C (3,034°F), titanium can withstand high temperatures, making it suitable for aerospace and automotive applications.
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Non-Magnetic and Non-Toxic: These properties make titanium ideal for applications in MRI machines and other sensitive electronic devices.
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Fatigue Resistance: Titanium demonstrates excellent resistance to metal fatigue, crucial in cyclic loading applications such as aircraft parts.
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(Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target)
Parameters of Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target
The parameters for a titanium Ti sputtering target can vary depending on the specific requirements of the process. Cependant, some common parameters include:
* Cross-sectional area: This is the surface area of the target that is being sputtered.
* Temperature: The temperature at which the target is being sputtered, typically between 700°C and 800°C.
* Chemical composition: The composition of the sputtering gas used to coat the target, including titanium and other materials.
* Purity level: The purity of the sputtering gas used to coat the target, as well as any other chemicals involved in the process.
* Wavelength of light: The wavelength of light used to sputter the titanium target, typically between 530nm and 690nm.
These parameters are important because they affect the rate at which titanium is deposited onto the target, as well as the quality of the final product. A better understanding of these parameters and their impact on the process can help ensure that the sputtering process is optimized for the desired production conditions.
(Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target)
Profil de l'entreprise
Metal Mummy est un fournisseur mondial de matériaux chimiques de confiance & fabricant avec plus de 12 ans d'expérience dans la fourniture de produits en cuivre et apparentés de très haute qualité.
L'entreprise dispose d'un département technique professionnel et d'un département de supervision de la qualité., un laboratoire bien équipé, et équipé d'un équipement de test avancé et d'un centre de service client après-vente.
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FAQ
(Round Titanium Ti Sputtering Target Gr1 Gr2 Sputtering Target)
