Overview of High purity 3N titanium sputtering target Titanium Round Target
Titanium (Na) sinadari ne mai lambar atomic 22 kuma ana masa alama a matsayin Ti akan tebur na lokaci-lokaci. Yana cikin ƙungiyar canjin karafa kuma an san shi da ƙarancin ƙarancinsa, babban ƙarfi-da-nauyi rabo, da kuma na kwarai lalata juriya. An gano a ciki 1791 da William Gregor, titanium ya zama abu mai mahimmanci a cikin masana'antu da yawa saboda haɗin haɗin kai na musamman.
Feature of High purity 3N titanium sputtering target Titanium Round Target
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Ƙarfin Ƙarfi da Ƙarfi Mai Girma: Titanium ne game da 45% ya fi karfe wuta amma yana da irin wannan ƙarfi, yin shi manufa don aikace-aikace inda rage nauyi yana da mahimmanci ba tare da rage ƙarfin ba.
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Juriya na Lalata: Yana samar da Layer oxide mai wucewa wanda ke kare ƙarfen da ke ƙasa daga abubuwa masu lalata, ciki har da ruwan teku da chlorine, yin shi sosai juriya ga lalata.
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Daidaitawar halittu: Titanium yana jurewa da kyau daga jikin ɗan adam kuma baya haifar da mummunan halayen, wanda shine dalilin da ya sa ake amfani da shi sosai a cikin kayan aikin likita da kayan aikin tiyata.
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Juriya mai zafi: Tare da wurin narkewa na 1,668°C (3,034°F), titanium na iya jure yanayin zafi, sanya shi dacewa da sararin samaniya da aikace-aikacen motoci.
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Mara Magnetic da Mara guba: Waɗannan kaddarorin suna sa titanium manufa don aikace-aikace a cikin injin MRI da sauran na'urorin lantarki masu mahimmanci.
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Resistance Gajiya: Titanium yana nuna kyakkyawan juriya ga gajiyar ƙarfe, mai mahimmanci a aikace-aikacen loda cyclic kamar sassan jirgin sama.
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(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, density, da tsarki. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Misali, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
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(High purity 3N titanium sputtering target Titanium Round Target)
