Overview of High purity 3N titanium sputtering target Titanium Round Target
Titanium (No) he mea kemika me ka helu atomika 22 a ua hōʻailona ʻia ʻo Ti ma ka papa ʻaina. No ka hui metala hoʻololi a ʻike ʻia no kona haʻahaʻa haʻahaʻa, kiʻekiʻe ikaika-i-kaumaha ratio, a me ke kū'ē i ka corrosion. ʻIke ʻia ma 1791 na William Gregor, Ua lilo ka titanium i mea koʻikoʻi ma waena o nā ʻoihana he nui ma muli o kāna hui kūʻokoʻa o nā waiwai.
Feature of High purity 3N titanium sputtering target Titanium Round Target
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Haʻahaʻa haʻahaʻa a me ka ikaika kiʻekiʻe: ʻO ka Titanium e pili ana 45% ʻoi aku ka māmā ma mua o ke kila akā loaʻa ka ikaika like, hana ia i mea kūpono no nā noi i mea koʻikoʻi ka hoʻēmi kaumaha me ka ʻole o ka hoʻohaumia ʻana i ka ikaika.
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Pale ʻino: Hoʻokumu ia i kahi papa ʻokikene passive e pale i ka metala lalo mai nā mea ʻino, me ka wai kai a me ka chlorine, ʻo ia ke kūpaʻa loa i ka ʻino.
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Biocompatibility: Ua ʻae maikaʻi ʻia ka Titanium e ke kino o ke kanaka a ʻaʻole hoʻi i nā hopena ʻino, ʻo ia ke kumu i hoʻohana nui ʻia i nā implants lapaʻau a me nā mea hana ʻoki.
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Kū'ē wela: Me kahi helu hehee o 1,668°C (3,034°F), hiki i ka titanium ke pale i nā wela kiʻekiʻe, kūpono ia no ka aerospace a me nā noi kaʻa.
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Non-Magnetic a me Non-Toxic: Hana kēia mau waiwai i ka titanium no nā noi i nā mīkini MRI a me nā mea uila ʻē aʻe.
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Paleʻa luhi: Hōʻike ka Titanium i ke kūpaʻa maikaʻi loa i ka luhi metala, mea koʻikoʻi i nā noi hoʻouka cyclic e like me nā ʻāpana mokulele.
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(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, density, a me ka maemae. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. ʻo kahi laʻana, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
ʻIkepili Hui
ʻO Metal Mummy kahi mea hoʻolako mea hoʻohana kemika honua & mea hana me ka ʻoi aku o 12 mau makahiki-ʻike i ka hāʻawi ʻana i nā huahana keleawe kiʻekiʻe kiʻekiʻe a me nā mea pili.
He keʻena ʻenehana loea ko ka hui a me ka Quality Supervision Department, he hale hana i hoolako pono ia, a hoʻolako ʻia me nā lako hoʻāʻo kiʻekiʻe a me ke kikowaena lawelawe mea kūʻai aku ma hope o ke kūʻai aku.
Inā ʻoe e ʻimi nei i ka pauka metala kiʻekiʻe a me nā huahana pili, eʻoluʻolu e leka uila iā mākou a iʻole e kaomi i nā huahana i makemakeʻia e hoʻouna i kahi nīnau.
Uku Uku
L/C, T/T, Hui Komohana, Paypal, Kāleka ʻaiʻē etc.
Hoʻouna
Hiki ke hoʻouna ʻia ma ke kai, ma ka lewa, a i ʻole ma ka hōʻike ʻana iā ASAP i ka wā e loaʻa ai ka uku.
FAQ
(High purity 3N titanium sputtering target Titanium Round Target)
