factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target

Overview of factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target

Titanium (Nke) bụ ihe mejupụtara kemịkalụ nwere ọnụọgụ atọm 22 ma gosipụta ya dị ka Ti na tebụl oge. Ọ bụ nke mgbanwe metals otu na mara maka ya ala njupụta, oke ike na oke oke, na ahụkebe nguzogide corrosion. Achọpụtara na 1791 nke William Gregor dere, titanium abụrụla ihe dị mkpa n'ofe ọtụtụ ụlọ ọrụ n'ihi nchikota ya pụrụ iche.

Feature of factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target

1. Njupụta dị ala na ike dị elu: Titanium bụ ihe 45% dị ọkụ karịa ígwè mana ọ nwere ike yiri ya, na-eme ka ọ dị mma maka ngwa ebe mbelata ibu dị oke mkpa na-enweghị imebi ike.

2. Nguzogide corrosion: Ọ na-etolite oyi akwa oxide na-agafe agafe nke na-echebe metal dị n'okpuru site na ihe ndị na-emebi emebi, gụnyere mmiri mmiri na chlorine, na-eme ka ọ bụrụ nke ukwuu na-eguzogide corrosion.

3. Biocompatibility: Titanium na-anabata nke ọma site na ahụ mmadụ ma ọ dịghị akpata mmeghachi omume ọjọọ, nke mere na a na-eji ya eme ihe na ntinye ọgwụ na ngwa ịwa ahụ.

4. Okpomọkụ Nguzogide: N'ebe mgbaze nke 1,668°C (3,034°F), titanium nwere ike iguzogide oke okpomọkụ, na-eme ka ọ dị mma maka ngwa ikuku na ụgbọ ala.

5. Na-abụghị magnetik na nke na-adịghị egbu egbu: Ihe ndị a na-eme ka titanium dị mma maka ngwa na igwe MRI na ngwaọrụ eletrọnịkị ndị ọzọ nwere mmetụta.

6. Nguzogide ike ọgwụgwụ: Titanium na-egosiputa ezigbo iguzogide ike ọgwụgwụ metal, dị mkpa na ngwa cyclic loading dị ka akụkụ ụgbọ elu.

.

(factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target)

Parameters of factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target

Nke “direct 4N purityHIP method” for Ti target and titanium sputtering target is a highly efficient and effective technique that can achieve extremely high purity levels in Ti. This process typically involves the use of a mixture of plasma sources, including a direct beam source and a high energy ion source, to create Ti targets with very low impurities.
The purity level of the Ti target can be significantly improved by using the HIP method, which involves heating the Ti target to extremely high temperatures, creating a plasma pool at the surface of the target. The plasma is then bombarded with ions from a higher-energy source, such as a neutral gas or a special cathode gas, which combine with the plasma to form titanium ions. These titanium ions are then collected and terminated onto the surface of the Ti target, resulting in a highly pure Ti target.
In addition to improving the purity of the Ti target, the HIP method also provides several other advantages over traditional techniques, such as better control over the ionization conditions and higher efficiency in the removal of impurities. By carefully selecting and optimizing the parameters used in this process, it is possible to achieve high purity levels even in cases where impurities may accumulate at the surface of the Ti target.

(factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target)

Nkọwapụta Ụlọ ọrụ

Metal Mummy bụ onye na-eweta kemịkalụ zuru ụwa ọnụ nke ntụkwasị obi & emeputa ihe karịrị 12-afọ ahụmahụ na-enye super-edu ọla kọpa na ndị ikwu ngwaahịa.

Ụlọ ọrụ ahụ nwere ngalaba nka ọkachamara na Ngalaba Nlekọta Ogo, ụlọ nyocha nke ọma, na kwadebere na elu ule akụrụngwa na mgbe-sales ahịa ọrụ center.

Ọ bụrụ na ị na-achọ ntụ ntụ metal dị elu na ngwaahịa ndị ikwu, biko nweere onwe gị ịkpọtụrụ anyị ma ọ bụ pịa ngwaahịa ndị dị mkpa iji zipu ajụjụ.

Ụzọ ịkwụ ụgwọ

L/C, T/T, Western Union, Paypal, Kaadị kredit wdg.

Mbupu

Enwere ike ibu ya n'oké osimiri, site n'ikuku, ma ọ bụ site na ikpughe ASAP ozugbo nnata nkwụghachi.

FAQ

(factory directly 4N (99.99%) purity HIP method Ti target Titanium sputtering target)