Overview of high purity GR1 sputtering titanium target
Titanium (Nke) bụ ihe mejupụtara kemịkalụ nwere ọnụọgụ atọm 22 ma gosipụta ya dị ka Ti na tebụl oge. Ọ bụ nke mgbanwe metals otu na mara maka ya ala njupụta, oke ike na oke oke, na ahụkebe nguzogide corrosion. Achọpụtara na 1791 nke William Gregor dere, titanium abụrụla ihe dị mkpa n'ofe ọtụtụ ụlọ ọrụ n'ihi nchikota ya pụrụ iche.
Feature of high purity GR1 sputtering titanium target
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Njupụta dị ala na ike dị elu: Titanium bụ ihe 45% dị ọkụ karịa ígwè mana ọ nwere ike yiri ya, na-eme ka ọ dị mma maka ngwa ebe mbelata ibu dị oke mkpa na-enweghị imebi ike.
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Nguzogide corrosion: Ọ na-etolite oyi akwa oxide na-agafe agafe nke na-echebe metal dị n'okpuru site na ihe ndị na-emebi emebi, gụnyere mmiri mmiri na chlorine, na-eme ka ọ bụrụ nke ukwuu na-eguzogide corrosion.
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Biocompatibility: Titanium na-anabata nke ọma site na ahụ mmadụ ma ọ dịghị akpata mmeghachi omume ọjọọ, nke mere na a na-eji ya eme ihe na ntinye ọgwụ na ngwa ịwa ahụ.
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Okpomọkụ Nguzogide: N'ebe mgbaze nke 1,668°C (3,034°F), titanium nwere ike iguzogide oke okpomọkụ, na-eme ka ọ dị mma maka ngwa ikuku na ụgbọ ala.
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Na-abụghị magnetik na nke na-adịghị egbu egbu: Ihe ndị a na-eme ka titanium dị mma maka ngwa na igwe MRI na ngwaọrụ eletrọnịkị ndị ọzọ nwere mmetụta.
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Nguzogide ike ọgwụgwụ: Titanium na-egosiputa ezigbo iguzogide ike ọgwụgwụ metal, dị mkpa na ngwa cyclic loading dị ka akụkụ ụgbọ elu.
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(high purity GR1 sputtering titanium target)
Parameters of high purity GR1 sputtering titanium target
The high purity GR1 target parameter is important in the performance of your sputtering titanium target because it affects the type of electron that gets produced and the energy used during the sputtering process. The higher the value of the target parameter, the more highly reactive electrons will be generated, leading to higher energy input and lower energy output.
Some common values for the target parameter include:
– Target voltage: 5.0 kV
– Target current: 25 A
– Graining rate (G): 18.0 m/s^2
– Feed-down time (Td): 400 ms
– Edge and source location parameters (E/L): 3.0 x 10^-6 m and 9 x 10^-6 m respectively
By adjusting these values, you can improve the surface of your target and increase its surface area, which can lead to higher energy output and better targeting accuracy.
(high purity GR1 sputtering titanium target)
Nkọwapụta Ụlọ ọrụ
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