High purity 3N titanium sputtering target Titanium Round Target

Overview of High purity 3N titanium sputtering target Titanium Round Target

티탄 (Ti) is a chemical element with the atomic number 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Discovered in 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.

Feature of High purity 3N titanium sputtering target Titanium Round Target

1. Low Density and High Strength: Titanium is about 45% lighter than steel but possesses similar strength, making it ideal for applications where weight reduction is critical without compromising strength.

2. Corrosion Resistance: It forms a passive oxide layer that protects the underlying metal from corrosive substances, including sea water and chlorine, making it highly resistant to corrosion.

3. Biocompatibility: Titanium is well-tolerated by the human body and doesn’t cause adverse reactions, which is why it’s widely used in medical implants and surgical instruments.

4. 내열성: With a melting point of 1,668°C (3,034°F), titanium can withstand high temperatures, making it suitable for aerospace and automotive applications.

5. Non-Magnetic and Non-Toxic: These properties make titanium ideal for applications in MRI machines and other sensitive electronic devices.

6. Fatigue Resistance: Titanium demonstrates excellent resistance to metal fatigue, crucial in cyclic loading applications such as aircraft parts.

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(High purity 3N titanium sputtering target Titanium Round Target)

Parameters of High purity 3N titanium sputtering target Titanium Round Target

The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:

* Material quality: The material used in the target determines its properties such as melting point, density, and purity. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. For example, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.

It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.

(High purity 3N titanium sputtering target Titanium Round Target)

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(High purity 3N titanium sputtering target Titanium Round Target)