High purity 3N titanium sputtering target Titanium Round Target

Overview of High purity 3N titanium sputtering target Titanium Round Target

Titanium (O) he huānga matū me te tau ngota 22 a ka tohuhia hei Ti i runga i te ripanga waahi. No te roopu konganuku whakawhiti, e mohiotia ana mo tona kiato iti, teitei kaha-ki-taimaha ōwehenga, me te tino parenga waikura. I kitea i roto i 1791 na William Gregor, Ko te titanium kua noho hei taonga nui puta noa i nga umanga maha na tona whakakotahitanga ahurei o nga rawa.

Feature of High purity 3N titanium sputtering target Titanium Round Target

1. Iti Kiato me te Kaha Teitei: Titanium e pā ana ki 45% he mama ake i te rino engari he rite te kaha, kia pai mo nga tono he mea nui te whakaheke taumaha me te kore e whakararu i te kaha.

2. Te Waihanga Atete: Ka hanga he papa waikura hāngū hei tiaki i te whakarewa o raro mai i nga matū pirau, tae atu ki te wai moana me te maota, kia tino ātete ki te waikura.

3. Te paioraora: Ko te Titanium he pai te whakamanahia e te tinana o te tangata, a, kaore e puta he mate kino, Ko te aha i whakamahia nuitia ai i roto i nga taputapu rongoa me nga taputapu rongoa.

4. Parenga Wera: Me te ira whakarewa 1,668°C (3,034°F), Ka taea e te titanium te tu ki te wera nui, kia pai ai mo te aerospace me nga tono miihini.

5. Kore-aukume me te kore-Toxic: Ko enei taonga ka pai te titanium mo nga tono i roto i nga miihini MRI me etahi atu taputapu hiko tairongo.

6. Ātete Rohirohi: Ko te Titanium e whakaatu ana i te tino kaha ki te ngenge whakarewa, he mea nui ki nga tono uta porohita penei i nga waahanga rererangi.

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(High purity 3N titanium sputtering target Titanium Round Target)

Parameters of High purity 3N titanium sputtering target Titanium Round Target

The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:

* Material quality: The material used in the target determines its properties such as melting point, density, me te ma. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Hei tauira, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.

It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.

(High purity 3N titanium sputtering target Titanium Round Target)

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(High purity 3N titanium sputtering target Titanium Round Target)