Overview of High purity 3N titanium sputtering target Titanium Round Target
Titanium (Ti) yog ib qho tshuaj lom neeg nrog tus lej atomic 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Tshawb pom hauv 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.
Feature of High purity 3N titanium sputtering target Titanium Round Target
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Tsis tshua muaj ntom thiab lub zog siab: Titanium yog hais txog 45% sib dua hlau tab sis muaj lub zog zoo sib xws, ua rau nws zoo tagnrho rau cov ntawv thov uas qhov hnyav txo yog qhov tseem ceeb yam tsis muaj kev cuam tshuam lub zog.
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Corrosion Resist: Nws tsim ib txheej passive oxide uas tiv thaiv cov hlau hauv qab los ntawm cov khoom corrosive, suav nrog dej hiav txwv thiab chlorine, ua rau nws tiv taus heev rau corrosion.
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Biocompatibility: Titanium yog qhov zoo tiv taus los ntawm tib neeg lub cev thiab tsis ua rau muaj kev phiv tshuaj, uas yog vim li cas nws thiaj li siv dav hauv kev cog kev kho mob thiab cov cuab yeej phais mob.
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Tshav kub tsis kam: Nrog lub melting point ntawm 1,668 °C (3,034°F), titanium tuaj yeem tiv taus qhov kub siab, ua rau nws haum rau kev siv aerospace thiab tsheb.
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Tsis muaj hlau nqus thiab tsis muaj tshuaj lom: Cov khoom no ua rau titanium zoo tagnrho rau kev siv hauv MRI tshuab thiab lwm yam khoom siv hluav taws xob rhiab.
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Qaug zog tsis kam: Titanium qhia tau hais tias zoo heev tsis kam rau hlau qaug zog, uas yog qhov tseem ceeb nyob rau hauv cyclic loading daim ntawv thov xws li aircraft qhov chaw.
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(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, density, g. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. For example, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
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(High purity 3N titanium sputtering target Titanium Round Target)
