Overview of High purity 3N titanium sputtering target Titanium Round Target
Titaniyamu (Za) ndi chinthu chamankhwala chokhala ndi nambala ya atomiki 22 ndipo akuimiridwa ngati Ti pa tebulo la periodic. Ndi m'gulu la transition metals ndipo amadziwika chifukwa chochepa kwambiri, kuchuluka kwa mphamvu ndi kulemera, ndi kukana dzimbiri kwapadera. Zapezeka mu 1791 ndi William Gregor, Titaniyamu yakhala chinthu chofunikira m'mafakitale ambiri chifukwa cha kuphatikiza kwake kwapadera.
Feature of High purity 3N titanium sputtering target Titanium Round Target
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Low Density ndi High Mphamvu: Titaniyamu ndi pafupi 45% opepuka kuposa chitsulo koma ali ndi mphamvu zofanana, kupanga kukhala yabwino kwa ntchito kumene kuchepetsa kulemera n'kofunika popanda kusokoneza mphamvu.
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Kukaniza kwa Corrosion: Zimapanga oxide passive layer yomwe imateteza chitsulo chapansi pa zinthu zowononga, kuphatikizapo madzi a m'nyanja ndi klorini, kuzipangitsa kuti zisawonongeke ndi dzimbiri.
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Biocompatibility: Titaniyamu imaloledwa bwino ndi thupi la munthu ndipo sichimayambitsa zovuta, ndichifukwa chake amagwiritsidwa ntchito kwambiri m'ma implants azachipatala ndi zida za opaleshoni.
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Kukaniza Kutentha: Ndi malo osungunuka a 1,668 ° C (3,034°F), titaniyamu imatha kupirira kutentha kwambiri, kuzipangitsa kukhala zoyenera kwazamlengalenga ndi ntchito zamagalimoto.
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Non-Maginito ndi Non-Poizoni: Izi zimapangitsa kuti titaniyamu ikhale yoyenera kugwiritsidwa ntchito pamakina a MRI ndi zida zina zamagetsi zamagetsi.
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Kukaniza Kutopa: Titaniyamu ikuwonetsa kukana kwachitsulo kutopa, Zofunikira pakukweza kwapang'onopang'ono monga zida zandege.
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(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, kachulukidwe, ndi chiyero. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Mwachitsanzo, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
Mbiri Yakampani
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(High purity 3N titanium sputtering target Titanium Round Target)
