Overview of high purity GR1 sputtering titanium target
Titaniyamu (Za) ndi chinthu chamankhwala chokhala ndi nambala ya atomiki 22 ndipo akuimiridwa ngati Ti pa tebulo la periodic. Ndi m'gulu la transition metals ndipo amadziwika chifukwa chochepa kwambiri, kuchuluka kwa mphamvu ndi kulemera, ndi kukana dzimbiri kwapadera. Zapezeka mu 1791 ndi William Gregor, Titaniyamu yakhala chinthu chofunikira m'mafakitale ambiri chifukwa cha kuphatikiza kwake kwapadera.
Feature of high purity GR1 sputtering titanium target
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Low Density ndi High Mphamvu: Titaniyamu ndi pafupi 45% opepuka kuposa chitsulo koma ali ndi mphamvu zofanana, kupanga kukhala yabwino kwa ntchito kumene kuchepetsa kulemera n'kofunika popanda kusokoneza mphamvu.
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Kukaniza kwa Corrosion: Zimapanga oxide passive layer yomwe imateteza chitsulo chapansi pa zinthu zowononga, kuphatikizapo madzi a m'nyanja ndi klorini, kuzipangitsa kuti zisawonongeke ndi dzimbiri.
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Biocompatibility: Titaniyamu imaloledwa bwino ndi thupi la munthu ndipo sichimayambitsa zovuta, ndichifukwa chake amagwiritsidwa ntchito kwambiri m'ma implants azachipatala ndi zida za opaleshoni.
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Kukaniza Kutentha: Ndi malo osungunuka a 1,668 ° C (3,034°F), titaniyamu imatha kupirira kutentha kwambiri, kuzipangitsa kukhala zoyenera kwazamlengalenga ndi ntchito zamagalimoto.
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Non-Maginito ndi Non-Poizoni: Izi zimapangitsa kuti titaniyamu ikhale yoyenera kugwiritsidwa ntchito pamakina a MRI ndi zida zina zamagetsi zamagetsi.
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Kukaniza Kutopa: Titaniyamu ikuwonetsa kukana kwachitsulo kutopa, Zofunikira pakukweza kwapang'onopang'ono monga zida zandege.
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(high purity GR1 sputtering titanium target)
Parameters of high purity GR1 sputtering titanium target
The high purity GR1 target parameter is important in the performance of your sputtering titanium target because it affects the type of electron that gets produced and the energy used during the sputtering process. The higher the value of the target parameter, the more highly reactive electrons will be generated, leading to higher energy input and lower energy output.
Some common values for the target parameter include:
– Target voltage: 5.0 kV
– Target current: 25 A
– Graining rate (G): 18.0 m/s^2
– Feed-down time (Td): 400 ms
– Edge and source location parameters (E/L): 3.0 x 10^-6 m and 9 x 10^-6 m respectively
By adjusting these values, you can improve the surface of your target and increase its surface area, which can lead to higher energy output and better targeting accuracy.
(high purity GR1 sputtering titanium target)
Mbiri Yakampani
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FAQ
(high purity GR1 sputtering titanium target)
