Overview of High purity 3N titanium sputtering target Titanium Round Target
Titanium (Òf) ta un elemento kímiko ku e number atómiko 22 i ta wòrdu simbolisá komo Ti riba e tabel periódiko. E ta pertenesé na e grupo di metalnan di transishon i ta konosí pa su densidat abou, relashon haltu di forsa-pa-peso, i resistensia eksepshonal na koroshon. Deskubrí na 1791 pa William Gregor, titanio a bira un material vital den numeroso industria debí na su kombinashon úniko di propiedatnan.
Feature of High purity 3N titanium sputtering target Titanium Round Target
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Densidat Abou i Forsa Haltu: Titanium ta tokante 45% mas lihé ku staal pero ta poseé un forsa similar, hasiendo esaki ideal pa aplikashonnan kaminda redukshon di peso ta krusial sin komprometé forsa.
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Resistensia na Koroshon: E ta forma un kapa di òksido pasivo ku ta protehá e metal subyacente di supstansianan korosivo, inkluyendo awa di laman i klor, hasiendo esaki altamente resistente na koroshon.
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Biokompatibilidat: Titanium ta wòrdu bon tolerá pa e kurpa humano i no ta kousa reakshonnan adverso, kual ta e motibu pakiko e ta wòrdu usá ampliamente den implantenan médiko i instrumentonan kirúrgiko.
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Resistensia di Kalor: Ku un punto di smelt di 1.668°C (3,034°F), titanium por wanta temperatura haltu, hasiendo esaki adekuá pa aplikashonnan aeroespasio i outomotriz.
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No-Magnétiko i No-Tóksiko: E propiedatnan aki ta hasi titanium ideal pa aplikashonnan den mashinnan di MRI i otro aparatonan elektróniko sensitivo.
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Resistensia na Kansansio: Titanium ta demostrá un resistensia ekselente na kansansio di metal, krusial den aplikashonnan di karga sikliko manera piesanan di avion.
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(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, density, i puresa. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Por ehèmpel, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
Profil di e kompania
Metal Mummy ta un proveedó di material kímiko mundial di konfiansa & fabrikante ku mas ku 12 aña di eksperensia den suministro di produktonan di koper i parientenan di kalidat super haltu.
E kompania tin un departamentu tékniko profeshonal i un departamentu di supervishon di kalidat, un laboratorio bon ekipá, i ekipá ku ekipo di tèst avansá i sentro di servisio na kliente despues di benta.
Si bo ta buskando polvo di metal di kalidat haltu i produktonan relativo, por fabor sinti bo liber pa tuma kontakto ku nos òf klik riba e produktonan nesesario pa manda un konsulta.
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FAQ
(High purity 3N titanium sputtering target Titanium Round Target)
