High purity 3N titanium sputtering target Titanium Round Target

Overview of High purity 3N titanium sputtering target Titanium Round Target

Titanium (O) o se elemene kemisi ma le numera atomika 22 ma o loʻo faʻatusalia o le Ti i luga o le laulau faʻavaitaimi. E a'afia i le vaega o metala fesuia'i ma e lauiloa ona o lona maualalo maualalo, maualuga le malosi-i-mamafa fua faatatau, ma tulaga ese tete'e a'a. Na maua i totonu 1791 saunia e William Gregor, ua avea le titanium ma mea taua i le tele o alamanuia ona o lona tuufaatasiga tulaga ese o meatotino.

Feature of High purity 3N titanium sputtering target Titanium Round Target

1. Malosi maualalo ma Malosi maualuga: Titanium e uiga i 45% e mama nai lo le sila ae e tutusa lona malosi, faia lelei mo talosaga e fa'aitiitia ai le mamafa e taua tele e aunoa ma le fa'afefeteina o le malosi.

2. Tete'e a'e: E fa'atupu ai se fa'a'ese'ese pa'u e puipuia ai le u'amea o lo'o i lalo mai mea e pala, e aofia ai le sami ma le chlorine, e matua tete'e i le pala.

3. Biocompatibility: O le Titanium e talia lelei e le tino o le tagata ma e le mafua ai ni faʻalavelave leaga, o le mafuaʻaga lea e faʻaaogaina lautele ai i totonu o fomaʻi ma mea faʻapitoa.

4. Tete'e vevela: Faatasi ai ma se mea faʻafefeteina o le 1,668°C (3,034°F), e mafai e le titanium ona tatalia le vevela maualuga, e fa'atatau mo le va'alele ma mea tau ta'avale.

5. Le-Maneta ma le Oona: O nei meatotino e faʻaogaina ai le titanium mo faʻaoga i masini MRI ma isi masini eletise maaleale.

6. Tetee le vaivai: O le Titanium e fa'aalia lelei le tete'e atu i le vaivai u'amea, e taua tele i le fa'aosoina o uta e pei o vaega va'alele.

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(High purity 3N titanium sputtering target Titanium Round Target)

Parameters of High purity 3N titanium sputtering target Titanium Round Target

The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:

* Material quality: The material used in the target determines its properties such as melting point, density, ma le mama. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Faataitaiga, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.

It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.

(High purity 3N titanium sputtering target Titanium Round Target)

Fa'amatalaga a le Kamupani

Metal Mummy ose kamupani fa'atau oloa vaila'au fa'atuatuaina & tagata gaosi oloa ma sili atu i le 12-tausaga le poto masani i le tuʻuina atu o 'apamemea sili ona maualuga ma oloa tau aiga.

O loʻo i ai i le kamupani se matagaluega faʻapitoa faʻapolofesa ma le Vaega o le Vaavaaiga Lelei, se falesuesue ua saunia lelei, ma faʻapipiʻiina i masini suʻesuʻe faʻapitoa ma le faʻatau atu o tagata faʻatau auaunaga.

Afai o loʻo e suʻeina se paʻu uʻamea maualuga ma oloa faʻatatau, faamolemole lagona le saoloto e faʻafesoʻotaʻi i matou pe kiliki i luga o oloa manaʻomia e lafo ai se suʻesuʻega.

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(High purity 3N titanium sputtering target Titanium Round Target)