Overview of high purity GR1 sputtering titanium target
Titanium (Ti) waa curiye kiimiko leh nambarka atomiga 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Discovered in 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.
Feature of high purity GR1 sputtering titanium target
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Low Density and High Strength: Titanium is about 45% lighter than steel but possesses similar strength, making it ideal for applications where weight reduction is critical without compromising strength.
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Iska caabinta daxalka: It forms a passive oxide layer that protects the underlying metal from corrosive substances, including sea water and chlorine, making it highly resistant to corrosion.
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Biocompatibility: Titanium is well-tolerated by the human body and doesn’t cause adverse reactions, which is why it’s widely used in medical implants and surgical instruments.
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Iska caabinta kulaylka: With a melting point of 1,668°C (3,034°F), titanium can withstand high temperatures, making it suitable for aerospace and automotive applications.
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Non-Magnetic and Non-Toxic: These properties make titanium ideal for applications in MRI machines and other sensitive electronic devices.
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Fatigue Resistance: Titanium demonstrates excellent resistance to metal fatigue, crucial in cyclic loading applications such as aircraft parts.
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(high purity GR1 sputtering titanium target)
Parameters of high purity GR1 sputtering titanium target
The high purity GR1 target parameter is important in the performance of your sputtering titanium target because it affects the type of electron that gets produced and the energy used during the sputtering process. The higher the value of the target parameter, the more highly reactive electrons will be generated, leading to higher energy input and lower energy output.
Some common values for the target parameter include:
– Target voltage: 5.0 kV
– Target current: 25 A
– Graining rate (G): 18.0 m/s^2
– Feed-down time (Td): 400 ms
– Edge and source location parameters (E/L): 3.0 x 10^-6 m and 9 x 10^-6 m respectively
By adjusting these values, you can improve the surface of your target and increase its surface area, which can lead to higher energy output and better targeting accuracy.
(high purity GR1 sputtering titanium target)
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