Overview of High purity 3N titanium sputtering target Titanium Round Target
Titanium (Ti) jẹ eroja kemikali pẹlu nọmba atomiki 22 ati pe o jẹ aami bi Ti lori tabili igbakọọkan. O jẹ ti ẹgbẹ awọn irin iyipada ati pe a mọ fun iwuwo kekere rẹ, ga agbara-to-àdánù ratio, ati ki o exceptional ipata resistance. Awari ni 1791 nipasẹ William Gregor, titanium ti di ohun elo pataki kọja awọn ile-iṣẹ lọpọlọpọ nitori apapo alailẹgbẹ rẹ ti awọn ohun-ini.
Feature of High purity 3N titanium sputtering target Titanium Round Target
-
Iwuwo Kekere ati Agbara giga: Titanium jẹ nipa 45% fẹẹrẹfẹ ju irin ṣugbọn o ni agbara kanna, ṣiṣe ni apẹrẹ fun awọn ohun elo nibiti idinku iwuwo jẹ pataki laisi agbara agbara.
-
Ipata Resistance: O ṣe fọọmu afẹfẹ afẹfẹ palolo ti o ṣe aabo fun irin ti o wa ni abẹlẹ lati awọn nkan ipata, pẹlu omi okun ati chlorine, ṣiṣe awọn ti o gíga sooro si ipata.
-
Biocompatibility: Titanium jẹ ifarada daradara nipasẹ ara eniyan ati pe ko fa awọn aati ikolu, ti o jẹ idi ti o fi n lo ni lilo pupọ ni awọn ifibọ iṣoogun ati awọn ohun elo iṣẹ abẹ.
-
Ooru Resistance: Pẹlu aaye yo ti 1,668°C (3,034°F), titanium le koju awọn iwọn otutu giga, ṣiṣe awọn ti o dara fun Aerospace ati Oko ohun elo.
-
Ti kii ṣe oofa ati kii ṣe majele: Awọn ohun-ini wọnyi jẹ ki titanium jẹ apẹrẹ fun awọn ohun elo ni awọn ẹrọ MRI ati awọn ẹrọ itanna eleto miiran.
-
Resistance rirẹ: Titanium ṣe afihan resistance to dara julọ si rirẹ irin, pataki ni awọn ohun elo ikojọpọ cyclic gẹgẹbi awọn ẹya ọkọ ofurufu.
.
(High purity 3N titanium sputtering target Titanium Round Target)
Parameters of High purity 3N titanium sputtering target Titanium Round Target
The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:
* Material quality: The material used in the target determines its properties such as melting point, density, ati mimọ. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. Fun apere, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.
It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.
(High purity 3N titanium sputtering target Titanium Round Target)
Ifihan ile ibi ise
Metal Mummy jẹ olutaja ohun elo kemikali agbaye ti o gbẹkẹle & olupese pẹlu iriri ju ọdun 12 lọ ni ipese Ejò didara ti o ga julọ ati awọn ọja ibatan.
Ile-iṣẹ naa ni ẹka imọ-ẹrọ ọjọgbọn ati Ẹka Abojuto Didara, yàrá ti o ni ipese daradara, ati ipese pẹlu to ti ni ilọsiwaju igbeyewo ẹrọ ati lẹhin-tita onibara iṣẹ aarin.
Ti o ba n wa erupẹ irin to gaju ati awọn ọja ibatan, jọwọ lero free lati kan si wa tabi tẹ lori awọn ọja ti o nilo lati firanṣẹ ibeere kan.
Awọn ọna isanwo
L/C, T/T, Western Union, Paypal, Kaadi Kirẹditi ati bẹbẹ lọ.
Gbigbe
O le jẹ gbigbe nipasẹ okun, nipa afẹfẹ, tabi nipasẹ fifihan ASAP ni kete ti iwe isanpada.
FAQ
(High purity 3N titanium sputtering target Titanium Round Target)
