High purity 3N titanium sputtering target Titanium Round Target

Overview of High purity 3N titanium sputtering target Titanium Round Target

Titanio (Ti) leti' jump'éel elemento químico yéetel u meyaj ku atómico 22 yéetel ku chíikbesa'al bey Ti ti' le tabla periódica. ti' le múuch' metales transición yéetel leti'e' k'ajóolta'an tumen u baja densidad, ka'anal relación muuk'-peso, yéetel resistencia ti' le corrosión excepcional. Descubierto ti' 1791 tumen William Gregor, le titanio ts'o'ok u suut jump'éel ba'al jach k'a'anan ichil ya'abkach industria'ob tumen u chen combinación u propiedades.

Feature of High purity 3N titanium sputtering target Titanium Round Target

1. Baja densidad yéetel ka'anal muuk': Titanio jach yóok'ol 45% asab k'a'an ti' le acero ba'ale' yaan ti' jump'éel muuk' similar, beetik u jach ma'alob uti'al u aplicaciones tu'ux le reducción peso jach crítica xma' comprometer u muuk'.

2. Resistencia ti' le corrosión: Ku beetik jump'éel capa óxido pasivo ku kanáantik le metal subyacente ti' sustancias corrosivas, ichil le je'elo'oba' yaan ja' k'áak'náab yéetel cloro, beetik u jach resistente ti' le corrosión.

3. Biocompatibilidad: Le titanio jach ma'alob tolerado tumen u wíinkilal wíinik yéetel ma' causa reacciones adversas, le o'olal jach ku meyaj ti' implantes ts'aako'ob yéetel instrumentos quirúrgicos.

4. Resistencia ti' le ooxoj: Yéetel jump'éel ch'aaj fusión 1,668°C (3,034°F), le titanio je'el u páajtal u soportar ka'anal temperatura, beetik u jach ma'alob uti'al u meyaj aeroespacial yéetel automotriz.

5. Ma' magnético yéetel ma' tóxico: Le ba'alo'oba' ku beetiko'ob u titanio jach ma'alob uti'al u meyaj ti' máquinas MRI yéetel uláak' dispositivos electrónicos sensibles.

6. Resistencia ti' le fatiga: Le titanio ku ye'esik jump'éel ma'alob resistencia ti' le fatiga metal, jach k'a'anan ti' aplicaciones u kuuch cíclica bey páajtal a péepenk'áak'o'.

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(High purity 3N titanium sputtering target Titanium Round Target)

Parameters of High purity 3N titanium sputtering target Titanium Round Target

The high purity 3N titanium sputtering target and the titanium round target have several parameters that can affect their performance as sputtering targets. Some of these parameters include:

* Material quality: The material used in the target determines its properties such as melting point, déensidad, yéetel pureza. Higher purity materials typically have better sputtering yields.
* Tungsten content: Tungsten is an essential component of the titanium sputtering target. Its presence affects the temperature at which titanium ions are vaporized and then sputtered onto the substrate.
* Coating type: The coating on the target can affect its properties, such as the passivation layer that forms between titanium ions and the substrate surface. Different coatings can also provide different chemical reactions for sputtering.
* Impurities: impurities in the material or coating can reduce the performance of the target. jéel bix, impurities in the TiO2 coating can reduce the sputtering yield by blocking ion flow.

It’s important to note that the specific parameters that affect the performance of the target will depend on the desired application and the type of target being used. It’s best to consult with experts in the field for guidance on selecting and optimizing a suitable target.

(High purity 3N titanium sputtering target Titanium Round Target)

Perfil ti' le empresa

Metal Mummy jach jump'éel proveedor xooko'obo' químico global u confiable & fabricante yéetel asab u 12 ja'abo'ob yaan ti' kaambalo'ob ti' le ts'aik cobre super ka'anal calidad yéetel yik'áalil láak'tsilo'ob.

Le empresa yaan ti' jump'éel departamento técnico j-ka'ansajo'ob yéetel Departamento supervisión calidad, jump'éel laboratorio ma'alob nu'ukulo'ob, yéetel equipado yéetel nu'ukulil prueba avanzada yéetel chúumukil mayaj ti' le cliente post-venta.

Wa ka kaxtik juuch'bil metal ka'anal calidad yéetel yik'áalil relativos, ma' dude ti' contactar k wa u beetik clic ti' le yik'áalil k'a'abeto'ob utia'al túuxtik jump'éel consulta.

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(High purity 3N titanium sputtering target Titanium Round Target)