Whole titanium sputtering target

Overview of Whole titanium sputtering target

I-Titanium (Kwe) iyikhemikhali enenombolo ye-athomu 22 futhi ifanekiselwa njengo-Ti etafuleni le-periodic. Iyingxenye yeqembu le-transition metals futhi yaziwa ngokuminyana kwayo okuphansi, isilinganiso esiphezulu samandla nesisindo, kanye nokumelana nokugqwala okukhethekile. Kutholwe ku 1791 nguWilliam Gregor, I-titanium isiphenduke into ebalulekile ezimbonini eziningi ngenxa yenhlanganisela yayo eyingqayizivele yezakhiwo.

Feature of Whole titanium sputtering target

1. Ukuminyana Okuphansi namandla Aphakeme: I-Titanium imayelana 45% ilula kunensimbi kodwa inamandla afanayo, okwenza kube kuhle ezinhlelweni zokusebenza lapho ukunciphisa isisindo kubalulekile ngaphandle kokuyekethisa amandla.

2. Ukumelana Nokugqwala: Yakha ungqimba lwe-passive oxide oluvikela insimbi engaphansi ezintweni ezigqwalayo, okuhlanganisa amanzi olwandle kanye ne-chlorine, okwenza imelane kakhulu nokugqwala.

3. I-Biocompatibility: I-Titanium ibekezelelwa kahle ngumzimba womuntu futhi ayibangeli ukusabela okubi, yingakho isetshenziswa kakhulu ekufakweni kwezokwelapha nasezintweni zokuhlinza.

4. Ukumelana Nokushisa: Ngephuzu lokuncibilika elingu-1,668°C (3,034°F), i-titanium ingamelana namazinga okushisa aphezulu, ukuyenza ilungele ukusetshenziswa kwe-aerospace kanye nezimoto.

5. I-Non-Magnetic and Non-Toxic: Lezi zakhiwo zenza i-titanium ilungele ukusetshenziswa emishinini ye-MRI nezinye izinto zikagesi ezibucayi.

6. Ukumelana Nokukhathala: I-Titanium ibonisa ukumelana okuhle kakhulu nokukhathala kwensimbi, okubalulekile ekulayisheni umjikelezo wezinhlelo zokusebenza njengezingxenye zendiza.

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(Whole titanium sputtering target)

Parameters of Whole titanium sputtering target

The parameters of a whole titanium sputtering target refer to the factors that influence the performance and behavior of the target during sputtering processes. Some of the key parameters include:

1. Cross-section area: The cross-sectional area of the target determines its surface area, which affects the number of ions that can be impinging on it per unit time.
2. Critical current density: The critical current density is the minimum amount of current needed for ionization and deposition to occur at a given temperature. It is an important parameter for controlling the rate of sputtering processes.
3. Sputtering velocity: The sputtering velocity determines how quickly ions with different energies and charges can collide with the target. A higher sputtering velocity results in faster ionization and deposition rates.
4. Temperature: The temperature of the target determines the rate of sputtering and the properties of the deposited layer. Higher temperatures result in more rapid sputtering and deposition, but may also lead to greater thermal stress and damage to the material being sputtered.
5. Characteristic sputtering parameters: These are specific characteristics of the sputtering process that depend on the above parameters, such as the deposition rate, grain size, and purity of the deposited layer.
6. Beam profile: The beam profile of the sputtering beam is also important, as it affects the diffraction pattern of the deposited layer and can affect the thickness of the deposit.

Sekukonke, understanding these parameters is crucial for optimizing the performance of a whole titanium sputtering target and achieving desired properties for industrial applications.

(Whole titanium sputtering target)

Iphrofayela Yenkampani

I-Metal Mummy ingumphakeli othembekile wezinto zamakhemikhali zomhlaba wonke & umkhiqizi onolwazi olungaphezu kweminyaka eyi-12 ekuhlinzekeni ngemikhiqizo yethusi esezingeni eliphezulu nezihlobo.

Le nkampani inomnyango wezobuchwepheshe oqeqeshiwe kanye noMnyango Wokuqondisa Ikhwalithi, ilabhorethri efakwe kahle, futhi ifakwe imishini yokuhlola ethuthukisiwe kanye nesikhungo senkonzo yamakhasimende ngemva kokuthengisa.

Uma ufuna impushana yensimbi yekhwalithi ephezulu kanye nemikhiqizo ehlobene, sicela ukhululeke ukuxhumana nathi noma uchofoze imikhiqizo edingekayo ukuze uthumele umbuzo.

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(Whole titanium sputtering target)